Heat Resistant Custom Flate Bottom Quartz Glass Crucible

Silica Quartz Glass Crucible:

Transparent Quartz Crucible (TQC) is a high-purity container made from fused silica glass (SiO₂ content≥99.99%), featuring excellent light transmittance (≥93% for visible light). It is mainly classified into three grades (QSG1, QSG2, QSG3) based on impurity content and performance indicators, as specified in the industry standard.

• Quartz crucible is widely used in PV and semiconductor domain.
• It can support solar and semi customer continuous long time pulling under high temperature.

Quartz crucible has the integrated performance which other materials don't have. There are excellent performance of resist thermal vibration, very high temperature of deformation and softening, very low performance of heat transmit and dielectric losing, the optical capacity of very wide UV spectra.

Arc quartz crucible is widely used in the semiconductor.

It’s made from natural quartz after the process of melting and fine grinding.

It has high purity, heat resistance and corrosion resistance, also be low coefficient of thermal expansion.

It contains no air bubble and controlled to the grade of PPM, has the great performance such as high temperature proof, chemical stability, perfect insulation and transmittance, etc.

Key Characteristics and Advantages

• Ultra-High Purity: Total content of metallic impurities (Na, K, Fe, etc.) is controlled below 10 ppm, ensuring no contamination of molten materials during high-temperature processes.
• Extreme Heat Resistance: Softening point reaches 1730°C, allowing long-term use at temperatures up to 1100°C and short-term peak use at 1450°C without deformation.
• Exceptional Chemical Stability: Except for hydrofluoric acid and hot phosphoric acid, it does not react with most acids, alkalis, and molten metals, with acid resistance 30 times that of ceramics and 150 times that of stainless steel.
• Outstanding Thermal Shock Resistance: Has an extremely low coefficient of thermal expansion (5.5×10⁻⁷/K), enabling it to withstand rapid temperature changes from 1100°C to room temperature without cracking.
• Excellent Insulation & Light Transmittance: Volume resistivity exceeds 10¹⁶ Ω·cm at high temperatures, and it transmits 80% of ultraviolet light and 93% of visible light, suitable for optical and high-temperature sensing applications.
• Strong Insulation: The resistance value of quartz glass is equivalent to 10,000 times that of ordinary glass, which is a very good electrical insulation material and has good insulation performance at room temperature.
• Good Light Transmittance: In the entire spectrum of ultraviolet to infrared wavelengths have good light transmission, visible light transmission rate of 93% or more in the ultraviolet spectrum region, the transmission rate of 80 or more.

Main Application Areas:Main Appilication of clear silica/quartz glass cylinder crucible :

Furnace melting , laboratory sintering/melting, electrical heater, muffle furnace heating, semiconductor, optical, communications, military, chemical, mechanical, electrical, environmental protection and other fields.

• Semiconductor Industry

Serves as a core container for pulling monocrystalline silicon in the Czochralski process, with annual demand exceeding 10 million pieces globally. The ultra-high purity prevents impurity introduction during silicon crystal growth, directly affecting the yield of integrated circuits.

Used for polycrystalline silicon ingot casting in photovoltaic solar cell production, with a service life of 50–80 hours per crucible, supporting the production of high-efficiency solar wafers.

• Laboratory & Chemical Analysis

Widely applied in high-temperature chemical experiments, such as sample digestion, melt analysis, and rare earth element purification, due to its corrosion resistance and non-contamination properties. Standard specifications include 10 mL, 25 mL, 50 mL, and 100 mL.

• Optical & Electronic Industry

Utilized in the melting process of high-purity optical glass and laser crystals, where its excellent light transmittance and heat resistance ensure the optical uniformity of the final product.

Serves as a high-temperature container for thin-film deposition equipment in electronic component manufacturing, maintaining stable performance in vacuum environments.

• Metallurgy & Material Synthesis

Used for melting high-purity metals (e.g., titanium, zirconium) and preparing advanced ceramic materials, preventing metal oxidation and contamination during the high-temperature process.

Production Process

Raw Material Selection: Uses high-purity natural quartz ore or synthetic silica powder with Fe₂O₃ content <0.001% to ensure product purity.

Melting & Forming:

• Electrical Melting Method: Places raw materials in a graphite mold, melts them at 1800–2000°C via arc discharge in a vacuum or protective atmosphere, and forms the crucible shape through gravity and surface tension.
• Flame Melting Method: Melts quartz powder with a hydrogen-oxygen flame and molds it into the desired shape using a rotating mold, suitable for small-sized crucibles.
• Post-Processing: Includes cooling, trimming, inner wall polishing, and cleaning to control surface roughness Ra <0.2 μm and ensure dimensional accuracy within ±0.5 mm.

Quality Inspection: Conducts strict checks for bubble defects (diameter <0.5 mm, quantity <5 per cm²), impurity content, and thermal shock resistance to meet industrial application standards.

Technical specifications