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heat resistance customize clear quartz petri dish-0

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Heat resistance customize clear quartz Petri dish

Clear quartz Petri dish standard size that we often produce is OD30mm, OD50mm, OD100mm and so on. And we can design and customize it according to clients requirement.

Introduction

Manufacturing Process and Workflow of clear quartz Petri dish

This method involves the secondary thermoforming of a pre-fabricated quartz tube into a crucible shape using gas pressure and a mold.

Stage 1: Preparation Phase

1. Raw Material Preparation
   · Material: High-purity, defect-free transparent quartz tubing. This tube is typically produced via an electrical or flame fusion process, and its quality dictates the final crucible's performance.
   · Mold Preparation: A high-precision, heat-resistant graphite or refractory alloy mold is used. The mold's cavity defines the external shape of the crucible (e.g., spherical, cylindrical, custom shapes).


2. Quartz Tube Pre-processing

   · Cutting: The quartz tube is cut to the required length.
   · Cleaning: The tube undergoes high-purity cleaning (e.g., with ultra-pure water, acid etching, ultrasonic cleaning) to remove all contaminants from the inner and outer walls.
   · Sealing One End: One end of the tube is heated using a hydrogen-oxygen torch until it melts and fuses shut, forming a smooth, hemispherical dome that becomes the bottom of the crucible.

Stage 2: Thermoforming Phase - The Core Process

This is the most critical step, performed on a specialized glassblowing lathe or automated forming machine.

1. Heating and Softening
   · The pre-processed quartz tube (sealed end first) is mounted on the lathe and positioned inside the pre-heated mold.
   · The target area (the future body of the crucible) is rotated and evenly heated using a hydrogen-oxygen flame or plasma torch. Rotation is crucial for uniform heating.
   · The quartz is heated to its softening point (approximately 1650-1800°C), where it becomes pliable but not fully molten.

2. Gas Pressurization and Forming
   · While the quartz is soft, high-purity inert gas (e.g., Nitrogen, Argon) is introduced into the tube through the open end, with its pressure precisely controlled.
   · The internal gas pressure forces the softened quartz wall to expand uniformly outward until it fully conforms to the shape of the mold's inner surface.
   · The mold defines the final external geometry, while the gas pressure ensures dimensional accuracy and a smooth surface finish.

3. Annealing and Cooling
   · After forming, the quartz Petri dish is immediately annealed while still in or near the mold. A broad, soft flame is used to relieve thermal stresses induced by rapid heating and cooling.
   · The formed quartz Petri dish is then cooled under controlled conditions to room temperature before being removed from the mold.

Stage 3: Post-Processing and Finishing


1. Cutting and Opening
   · The open end of the formed quartz Petri dish is cut to the exact specified height and squareness using a diamond wheel saw or laser cutter.
   · The sharp, cut edge is then fire-polished or mechanically ground to a smooth, rounded finish to prevent chipping and stress concentration.

2. High-Intensity Cleaning & Inspection
   · Cleaning: The quartz Petri dish undergoes a multi-step, high-purity cleaning process (acid cleaning, ultrasonic cleaning, rinsing with ultra-pure water) to remove all contaminants from processing.
   · Inspection:
     · Dimensional Check: Verifying diameter, height, and wall thickness.
     · Visual Inspection: Inspecting for bubbles, scratches, pits, or any irregularities on the inner and outer surfaces under controlled lighting.

Stage 4: Special High-End Treatment - Inner Surface Fire Polishing

For high-end crucibles used in semiconductor or premium photovoltaic applications, an additional critical step is performed:
· Inner Surface Fire Polishing
  · Purpose: To create a perfectly dense, smooth, mirror-like transparent layer on the clear quartz Petri dish inner surface.
  · Method: The quartz Petri dish is rotated while a hydrogen-oxygen flame or plasma torch is inserted and scanned across the entire interior surface.
  · Effects:
    · Seals Micro-Pores: Clear quartz Petri dish eliminates micro-cracks and tiny pores.
    · Reduces Roughness: Clear quartz Petri dish creates an atomically smooth surface, preventing material adherence and facilitating easy cleaning.
    · Enhances Devitrification Resistance: Significantly improves the clear quartz Petri dish resistance to crystallization at high temperatures, thereby extending the crucible's service life.

Summary Workflow Diagram of clear quartz Petri dish:
High-Purity Quartz Tube → Cutting → Cleaning → One-End Sealing → Mounting in Mold → Rotational Heating & Softening → Gas Pressure Forming → Annealing → Demolding → Cutting/Opening → Edge Polishing → (Inner Surface Fire Polishing) → High-Intensity Cleaning → Final Inspection → Clean Packaging

Advantages of clear quartz Petri dish:
· High Purity: Clear quartz Petri dish uses high-purity quartz tubing, minimizing contamination.
· High Precision: Clear quartz Petri dish mold-forming ensures excellent dimensional consistency.
· Shape Flexibility: Capable of producing complex and custom geometries.
· Superior Surface Quality: Fire polishing the clear quartz Petri dish achieves an exceptional inner surface finish.

Primary Applications:
· Semiconductor Industry: For high-temperature diffusion, oxidation processes, and epitaxy.
· Laboratory & R&D: For material synthesis, crystal growth, and high-temperature chemical reactions.
· Photovoltaics R&D: For experimental silicon growth and processing.
· Optoelectronics: For sintering phosphors, laser crystals, and other specialty materials.

  
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Technical Parameters

Property Content Unit Property Index
Density kg/cm³ 2.2×10³
Strength KHN₁₀₀ 570
Tensile Strength Pa(N/m²) 4.8×10⁷
Compression Strength Pa >1.1×10⁹
Coefficient of Thermal Expansion (20℃-300℃) cm/cm·℃ 5.5×10⁻⁷
Thermal Conductivity (20℃) W/m·℃ 1.4
Specific Heat (20℃) J/kg·℃ 660
Softening Point 1630
Annealing Point 1180

 

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