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Adjustable porosity and ≤0.005mm flatness CNC Ceramic Vacuum Chuck Table Wafer for Cleaning Chucks Request a free demo today
Core Advantages
What is a SiC Vacuum Chuck?
A vacuum chuck is a device that uses suction (a vacuum) to hold a workpiece in place during machining, grinding, or inspection, instead of using mechanical clamps.
A SiC Vacuum Chuck is one specifically manufactured from Silicon Carbide.
Why is Silicon Carbide (SiC) the Material of Choice?
This is the core of the matter. SiC possesses a unique combination of properties that make it ideal for this demanding application:
Exceptional Hardness and Wear Resistance:
Benefit: SiC is extremely hard (9.5 on the Mohs scale, close to diamond). This makes it highly resistant to abrasion from the workpiece (often a silicon wafer) and from any debris during processing. This ensures the chuck's surface remains flat and undamaged for a very long time, leading to a longer service life and less downtime.
Superior Stiffness (High Young's Modulus):
Benefit: SiC does not flex or deform easily under load. This provides exceptional dynamic stability during high-speed processes like grinding or machining. The chuck won't vibrate or distort, which is critical for achieving sub-micron tolerances.
Outstanding Thermal Properties:
Excellent Chemical Inertness:
Benefit: It is resistant to most acids, alkalis, and solvents used in semiconductor fabrication (e.g., in cleaning processes like RCA clean). This prevents the chuck from corroding or contaminating the wafers.
Low Density:
Benefit: Despite its great stiffness and hardness, SiC is relatively lightweight. This is advantageous for reducing the mass of moving parts in high-speed machinery.
Application Scenarios
Technical Parameters Table
Property |
Typical Value / Description |
Significance in Aeration |
Material Composition |
>90% Silicon Carbide (SiC), with sintering aids. |
Provides extreme hardness and chemical stability. |
Color |
Dark Gray to Black |
- |
Porosity |
40% - 50% |
High void volume allows for high air throughput with low pressure loss. |
Average Pore Size |
50 - 200 microns (customizable) |
Determines bubble size. Smaller pores (<100µm) produce finer bubbles for superior oxygen transfer. |
Density |
1.8 - 2.2 g/cm³ |
- |
Flexural Strength |
25 - 45 MPa |
High mechanical strength resists cracking from handling and installation stresses. |
Compressive Strength |
100 - 200 MPa |
Withstands significant hydrostatic pressure at the bottom of deep tanks/ponds without deforming. |
Hardness |
9.0 - 9.5 on Mohs scale |
Extremely abrasion-resistant. Ideal for environments with suspended solids. |
Chemical Resistance |
Excellent. Inert to all pH levels (1-14). Resists oxidation, solvents, and biological attack. |
Will not degrade in harsh wastewater, saline water, or during aggressive cleaning (e.g., with acids, caustics, or peroxide). |
Thermal Stability |
Up to 1600°C in air. |
Can be thermally cleaned (furnaced) to burn off stubborn organic fouling, a key maintenance advantage. |
Surface Characteristics |
Hydrophilic (water-attracting) |
Bubbles form easily at low pressure and resist "pinning" and coalescing into larger bubbles. |